Process of developing an image-wise exposed resist-coated substrate

摘要

A block copolymer novolak resin composition comprising at least one unit of the reaction product of an alkali-soluble phenolic polymer and a reactive ortho, ortho bonded oligomer having the formula: <IMAGE> (I) wherein x is from 2 to 7; wherein R is selected from hydrogen a lower alkyl group or lower alkoxy group having 1-4 carbon atoms and a halogen group; and Y1 is either a hydroxyl group; an alkoxy group or a halogen group; and Y2 is hydrogen, alkyl, alkoxy, halogen, hydroxyl, -CH2OH, -CH2- halogen, or -CH2-alkoxy group.