| 发明名称 |
METHOD OF PRODUCING TUNGSTEN-TITANIUM SPUTTER TARGETS AND TARGETS PRODUCED THEREBY |
| 摘要 |
Tungsten-titanium sputter targets of at least 95% theoretical density are provided with little or no beta (Ti, W) phase constituent. Such targets will minimize troublesome particulate emissions during sputter coating conditions.
|
| 申请公布号 |
US5234487(A) |
申请公布日期 |
1993.08.10 |
| 申请号 |
US19910685789 |
申请日期 |
1991.04.15 |
| 申请人 |
TOSOH SMD, INC. |
发明人 |
WICKERSHAM, JR., CHARLES E.;MUELLER, JOHN J. |
| 分类号 |
B22F5/00;B22F3/10;B22F3/12;C22C1/04;C22C27/04;C23C14/34 |
主分类号 |
B22F5/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
