发明名称 RADIATION-CURABLE COMPOSITION AND RADIATION-SENSITIVE RECORDING MATERIAL PREPARED THEREFROM FOR USE WITH HIGH-ENERGY RADIATION
摘要 A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.
申请公布号 US5234791(A) 申请公布日期 1993.08.10
申请号 US19890369677 申请日期 1989.06.21
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 DAMMEL, RALPH;DOESSEL, KARL-FRIEDRICH;LINGNAU, JUERGEN;THEIS, JUERGEN
分类号 G03F7/004;G03F7/029;G03F7/038;H01L21/027;H01L21/30 主分类号 G03F7/004
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