发明名称 |
RADIATION-CURABLE COMPOSITION AND RADIATION-SENSITIVE RECORDING MATERIAL PREPARED THEREFROM FOR USE WITH HIGH-ENERGY RADIATION |
摘要 |
A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.
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申请公布号 |
US5234791(A) |
申请公布日期 |
1993.08.10 |
申请号 |
US19890369677 |
申请日期 |
1989.06.21 |
申请人 |
HOECHST AKTIENGESELLSCHAFT |
发明人 |
DAMMEL, RALPH;DOESSEL, KARL-FRIEDRICH;LINGNAU, JUERGEN;THEIS, JUERGEN |
分类号 |
G03F7/004;G03F7/029;G03F7/038;H01L21/027;H01L21/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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