| 摘要 |
PURPOSE:To enable the obtaining of sufficient information as microscope with higher strength of a cantilever by mounting a diamond tip at the tip of the cantilever. CONSTITUTION:A photoresist 6 is formed on the rear of a mono-crystalline silicon wafer 1 and undergoes a patterning to etch the wafer 1 with the resist 6 patterned as mask. The resist 6 is peeled off to inscribe 7 on the side of the surface of the wafer 1 and a nucleus is made to develop and grow a diamond 2 as probe. An oxide film 8 is formed on the surface of the wafer 1 and further, a nitride film 4 on the surface thereof. Then, a spin coating of the resist 6 is applied on the surface of the wafer 1 and the resist 6 is removed according to the patterning. With the resist patterned as mask, the film 4 is etched on the surface of the wafer and the film 4 on the rear thereof is removed. Thereafter, the resist 6 is removed. The part etched is further etched until the film 8 on the rear of the wafer 1 and the diamond 2 are exposed. Then, a metal thin film is made to grow at the part etched. |
