ALIGNMENT OF SUBSTRATE AND SUBSTRATE WITH REFLECTION MARK USED FOR ALIGNMENT

摘要

PURPOSE:To enable alignment of substrates utilizing the reflection light beam of vacuum ultraviolet and soft X ray beams. CONSTITUTION:Reflection marks 4, each of which is formed by the one reflection layer consisting of multilayer film, are provided in the belt-shaped areas 3a of a scribe line region 3 surrounding the external circumference of exposure regions 2 on a wafer 1. The reflection layer of multilayer film effectively reflects the illuminating beam of short wavelength and high precision positioning can be realized by utilizing a vacuum ultraviolet ray or soft X ray beam as the exposure light beam of the wafer 1 for the positioning of the wafer 1. A diffraction grating or zone plate can be formed on the multilayer film reflection layer.