发明名称 PHOTOSENSITIVE POLYAMIC ALKYL ESTER COMPOSITION AND USING METHOD THEREOF
摘要 PURPOSE: To form a polylmide image on a substrate by incorporating a polyamic alkyl ester compsn. into a photosensitive negative or positive gradation compsn. CONSTITUTION: When a photosensitive negative gradation compsn. containing a polyamic alkylester and photosensitive base-producing agent is exposed, the photosensitive base-producing agent in the exposed area produces radical base. This acts as a catalyst to imidize the polyamic alkylester into insoluble partially imidized polyimide. When a photosensitive positive gradation compsn. containing polyamlc alkylester base or base precursor and a photosensitive acid-producing agent is exposed, the photosensitive acid producing agent in the positive gradation compsn. produces acid, which traps base in the exposed area of the film. By successively heating the positive gradation compsn. at low temp., partial imidization in the nonexposed area of the film is caused by the base catalyst. The positive gradation compsn. is developed by using a proper solvent.
申请公布号 JPH05197148(A) 申请公布日期 1993.08.06
申请号 JP19920206386 申请日期 1992.08.03
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 JIEFURII UIRIAMU RABADEII;DENISU RICHIYAADO MATSUKIIN;UIRII FUORUKUSEN;GUREGORII MAIKERU UOORAFU
分类号 G03F7/004;G03F7/038;G03F7/039;G03F7/38;H01L21/027 主分类号 G03F7/004
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