| 摘要 |
<p>PURPOSE: To prevent the occurrence of the invalid parts of a phase photomask by averting the formation of the undesirable longitudinal beam parts to be transferred onto the surface of integrated circuits in consequence of the transparent edge parts of phase shifters. CONSTITUTION: The method consists of a step for forming the photomask having a transparent quartz substrate 10 and plural non-transmitted light parts 12, a step for forming the plural transparent phase shift parts 14 built-up from this substrate 10, a step for providing at least one of the one-side ends of these phase shift parts 14 with the optically transparent edge parts 26 and a step for forming the transparent edge parts 26 of the phase shift parts 14 to a taper shape. Further, the inclination at the arbitrary point along the tapered edge parts between the photomask substrate and the phase shifters is set at an angle smaller than 45 deg. and the generation of an image is prevented by the spreading function intrinsic to the system.</p> |
