| 摘要 |
<p>PURPOSE: To obtain a method for manufacturing a phase transition mask by patterned phase transition layers and translucent layers. CONSTITUTION: This phase transition mask is provided with mask plates 11, 31. The translucent layers 12, 32 are deposited on these mask plates 11, 31. Next, the translucent layers 12, 32 are patterned to prescribed shape patterns. The patterning of the translucent layers 12, 32 is continued down into the mask plates 11, 31 at prescribed distances, by which the phase transition masks 20, 30 are formed.</p> |
