| 摘要 |
PURPOSE:To form transparent film patterns such as transparent electrode film or transparent wiring film or the like through accurate position matching on both front and rear surfaces of a transparent panel such as glass material with extremely simplified process at a low cost. CONSTITUTION:Transparent thin films 11, 12 are formed on both front and rear surfaces of a transparent panel 3. Next, photoresist films 13, 14 are formed on both transparent thin films 11, 12. Thereafter, the one photoresist film 13 of both photoresist films 13, 14 is exposed through a mask 15. Next, after both photoresist films 13, 14 are developed, the etching is carried out for the entire part. |
