发明名称 Semiconductor substrate and method for preparing same.
摘要 <p>A semiconductor substrate comprises an insulating layer and a compound semiconductor monocrystal thin film formed on said insulating layer, the thermal expansion coefficient of said insulating layer being in the range of 60%-140% of that of said monocrystal thin film.</p>
申请公布号 EP0553856(A2) 申请公布日期 1993.08.04
申请号 EP19930101417 申请日期 1993.01.29
申请人 CANON KABUSHIKI KAISHA 发明人 SAKAGUCHI, KIYOFUMI;YONEHARA, TAKAO;MIYAWAKI, MAMORU
分类号 H01L21/20;H01L21/306;H01L21/762;H01L31/18 主分类号 H01L21/20
代理机构 代理人
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