| 发明名称 |
Radio frequency induction plasma processing system utilizing a uniform field coil. |
| 摘要 |
<p>A plasma processing apparatus (10) comprising: a chamber (12) for supporting a workpiece (40); an inlet (30) for introducing a gas into the chamber (12); a coil (14) of conductive material having a generally flattened configuration whereby to provide a at least one generally planar surface (44, 46) defined by parallel conductors disposed on the chamber (12); and apparatus (60) for applying radio frequency energy to the coil (14). <IMAGE></p> |
| 申请公布号 |
EP0553704(A1) |
申请公布日期 |
1993.08.04 |
| 申请号 |
EP19930100828 |
申请日期 |
1993.01.21 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CUOMO, JEROME JOHN;GUARNIERI, CHARLES RICHARD;HOPWOOD, JEFFREY ALAN;WHITEHAIR, STANLEY JOSEPH |
| 分类号 |
H01L21/205;C23F4/00;H01J37/32;H01L21/027;H01L21/30;H01L21/302;H01L21/3065;H01L21/31 |
主分类号 |
H01L21/205 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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