发明名称 Phosphorous removal from tetrachlorosilane
摘要 The present invention relates to a method for the purification of tetrachlorosilane used for the manufacture of electronic grade silicon and, more particularly, to a method for removing trace impurities of phosphorus. The method involves contacting liquid tetrachlorosilane with activated charcoal. The process is effective in reducing the phosphorus levels in the tetrachlorosilane to the parts per trillion range. The process can be run as a continuous or batch process with easy separation of the activated charcoal. containing the phosphorus contaminate from the tetrachlorosilane.
申请公布号 US5232602(A) 申请公布日期 1993.08.03
申请号 US19920907276 申请日期 1992.07.01
申请人 HEMLOCK SEMICONDUCTOR CORPORATION 发明人 BRINK, ROBERT G.;DEITERING, NORMAN H.;GREENE, MICHAEL H.;NGUYEN, KIMMAI T.
分类号 B01J20/20;B01D15/00;C01B33/107;C30B29/06 主分类号 B01J20/20
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