PHOTOMASK, EXPOSING METHOD AND PROJECTION ALIGNER

摘要

PURPOSE:To form a reticule pattern by projection aligning with a high resolution and large depth of focus. CONSTITUTION:A diffraction grating pattern RG1 for diffracting illumination light is formed on the glass surface of a reticule so as to face the reticule pattern RP1 of the reticule 1 and the + or -1st order diffracted light diffracted in the pattern is inclined by the angle corresponding to the pitch PR of the reticule pattern RP1 with respect to the reticule 1. The reticule pattern RP1 is irradiated with the light. This, the inclined illumination of the reticule pattern is enabled without improving the optical system for illumination.