| 摘要 |
PURPOSE:To enable the alignment of the photomask having a three-layered structure with high accuracy with the conventional device without adding a modification, etc., to an exposing device and to enable the use of the photomask having the three-layered structure without degrading the mass production efficiency of a semiconductor producing apparatus. CONSTITUTION:The alignment marks 15 formed on a mask in order to align the mask to an exposing position of the photomask having the three-layered structure the constituted by successively forming a 1st antireflection film 12, a light shielding film 13 and a 2nd antireflection film 14 on a glass substrate 11 are formed of the structure consisting of three-layered films and further, reflection films 16, 17 having the reflectivity higher than the reflectivity of the 1st antireflection film 12 are formed on the 2nd antireflection film 14 so as to cover the mark parts 15. |
