MASK PATTERN INSPECTING METHOD

摘要

PURPOSE:To easily inspect the placement relation between the device and process patterns before production of C a mask pattern. CONSTITUTION:The least rectangular area (c) including all component elements of a device pattern (a) is obtained based on the CAD data A on the pattern (a) (1). The drawing data showing a process pattern (b) is produced based on the CAD data B on the pattern (b) (2). The drawing data showing the area (c) is added to the drawing data on the pattern (b) for production of the synthetic drawing data (3). Then a synthetic pattern (bc) is produced based on the synthetic drawing data.