| 摘要 |
PURPOSE:To prevent the defect of transfer patterns occurring in the stick of foreign matter on a pellicle film and the infiltration thereof into the pellicle. CONSTITUTION:This pellicle is constituted by having a pellicle frame 3 which consists of a conductive resin, has vacuum attraction means 4, 5, 7 to a reticule or mask substrate 1 on one aperture surface S1 and a pellicle film tenting surface on the other aperture surface S2 and the pellicle film 8 tented on the pellicle tenting surface side of the pellicle frame 3 by means of a tightening frame 9 fitted externally onto the pellicle frame 3. The pellicle is so constituted that a potential 6 is applied to the pellicle frame at the time of exposing. |
