| 摘要 |
<p>PURPOSE:To eliminate the need for a masking process and to enable etching an unnecessary oxidized film without increasing the number of processes. CONSTITUTION:This method is equipped with a process for forming the electrode pattern of a 1st metal layer 13 forming a nonlinear resistance element on a light-transmissive substrate 11, a process for forming the oxidized film by the anode oxidation of the surface layer of the electrode pattern, a process for forming a 2nd metal layer selected among materials which can be removed by the same etching method as the oxidized film, at the part of the electrode pattern except an electrode terminal and on the substrate 11, a process for removing the oxidized film on the electrode terminal at a time while leaving the part corresponding to one electrode of at least the nonlinear resistance element of the 2nd metal layer 20, and a process for forming the display pixel pattern of a transparent conductive film.</p> |
