发明名称 METHOD AND APPARATUS FOR PRESSURE CONTROL OF LOW-PRESSURE CHAMBER
摘要 PURPOSE:To prevent a substrate from dropping when the vacuum suction power of a suction means inside a low-pressure chamber becomes insufficient at a power failure. CONSTITUTION:An air supply line 19 for emergency use is installed at a low- pressure chamber 1 whose pressure is reduced by using a first vacuum pump 3 and which is maintained in a low-pressure helium gas atmosphere by means of helium gas supplied from an air supply line 4. At a power failure, a first valve 19a in the air-supply line 19 for emergency use is opened, and the air is introduced into the low-pressure chamber 1 so as to prevent a drop in the pressure of the low-pressure chamber 1. Consequently, the vacuum suction power of a wafer chuck 7, a detection-stand chuck 10 and individual suction hands 11a, 11b which have been installed inside the low-pressure chamber 1 does not become insufficient.
申请公布号 JPH05190427(A) 申请公布日期 1993.07.30
申请号 JP19920019528 申请日期 1992.01.08
申请人 CANON INC 发明人 CHIBA YUJI;FUJIOKA HIDEHIKO;TANAKA YUTAKA;SUDO YUJI
分类号 G21K5/00;G03F7/20;G21K5/02;H01L21/027 主分类号 G21K5/00
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