Sputter installation - has at least one magnetron cathode and an electrically insulated screen limiting plasma propagation

摘要

Plasma is produced in a vacuum chamber kept at a certain potential. At least one electrode, which is kept at another potential and is surrounded by metal screen limiting the spatial propagation of the plasma, projects into the chamber. The screen is electrically insulated from the vacuum chamber. The potential of the vacuum chamber is the earth potential. A negative potential is applied to the electrode which carries a target made of a material for coating the substrate. The electrode is provided with a magnet whose field projects into the vacuum chamber, thus forming a magnetron. The screen is connected to a voltage source, with variable voltage (between -50V and +50V). Similarly the substrate is connected to a voltage source (39) with variable voltage. The screen is made of a non-ferromagnetic material (a special steel for example, is with good electrical conductivity. It is provided with a magnet whose field protrudes into the plamsa space. USE/ADVANTAGE - In the surface coating technology. The ionisation density in the substrate region is increased and, as a result, firmly attached thin coatings are produced at high rates.