| 摘要 |
<p>PURPOSE:To eliminate patterning defects by previously removing the unnecessary resist film in the peripheral part of a glass substrate. CONSTITUTION:The resist film 10 is formed and is subjected to overexposing in the peripheral part 14 shown by a hatched part where fine patterns do not exist. The overexposed resist is sufficiently solubilized in a developing soln. and is, therefore, completely dissolved away at the time of development. The floating of the modified matter of the resist in the developing soln. does not, therefore, arise and the remaining of redeposits, etc., on the surface of the resist film 10 is obviated. The patterning defects occurring in the presence of the unnecessary resist film in the parts exclusive of the display part are eliminated in this way.</p> |
