发明名称 DEVICE FOR PHOTOGRAMMETRICALLY SURVEYING AN OBJECT IN WHICH A REFERENCE PATTERN IS ARRANGED OUTSIDE SENSOR IMAGING BEAM PATHS
摘要 PCT No. PCT/EP90/02073 Sec. 371 Date Oct. 1, 1991 Sec. 102(e) Date Oct. 1, 1991 PCT Filed Dec. 3, 1990 PCT Pub. No. WO91/09273 PCT Pub. Date Jun. 27, 1991.In a device for photoqrammetrically surveying an object using a number of sensors which can be positioned individually with respect to the object, position of the sensors (5, 6, 7) an optical reference pattern records the respective positions of the sensors. The optical reference pattern is arranged outside the imaging-beam paths of the same in defined spatial position in absolute terms and is imaged via optical deviating means by means of sensors. Arranging the reference pattern (14) outside the imaging-beam paths gives greater freedom regarding the capability of positioning the sensors with respect to arranging the reference pattern on the object.
申请公布号 US5231292(A) 申请公布日期 1993.07.27
申请号 US19910768595 申请日期 1991.10.01
申请人 LEICA AARAU AG 发明人 WITTWER, WILLY
分类号 G01C15/00;G01B11/00;G01B11/245;G01C11/02 主分类号 G01C15/00
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