Image reception plane setting system for IC mfg. process - uses evaluation of structure obtained for sample IC substrate to provide correction values for setting elements

摘要

The setting system uses exposure of a sample IC substrate with measured position coordinates for the setting elements and evaluation of the obtained structure, to obtain correction values for the vertical and pivot movement of the substrate table and for the setting elements. The sample substrate is exposed to provide structures which can be evaluated to determine the image resolution and for determining its alignment, with a series of image fields arranged horizontally one after the other, with incremental variation of the exposure parameters. ADVANTAGE - Accurate setting up of imaging process for high density IC mfr.