| 摘要 |
PURPOSE:To provide a photosensitive resin compsn. capable of forming a uniform coating film having high sensitivity by incorporating a specified precursor of poly(amido)imide, specified acrylamidoglycolic acids and a photopolymn. initiator. CONSTITUTION:This photosensitive resin compsn. contains a precursor of poly(amido)imide contg. repeating units represented by formula I, acrylamidoglycolic acids represented by formula II and a photopolymn. initiator and/or a sensitizer. In the formula I, R<1> is a tri- or tetravalent org. group and R<2> is a divalent org. group. In the formula II, each of R<3> and R<4> is H, methyl or ethyl. The precursor of poly(amido)imide can be produced by bringing tetracarboxylic acid dianhydride, tricarboxylic acid anhydride or a deriv. thereof and diamine into a reaction in a solvent. |
