IMPROVED METHOD OF FABRICATING ANTIFUSES IN AN INTEGRATED CIRCUIT DEVICE AND RESULTING STRUCTURE
摘要
<p>Various improvements in the fabrication of an antifuse having silicon-amorphous silicon-metal layer structure are presented. Included are improved deposition techniques for the amorphous silicon layer (27). The improvements include steps for the fabrication of such an antifuse without the use of platinum and the resulting antifuse and contact structures.</p>
申请公布号
WO9216976(A1)
申请公布日期
1992.10.01
申请号
WO1992US01995
申请日期
1992.03.12
申请人
CROSSPOINT SOLUTIONS, INC.
发明人
DIXIT, PANKAJ;INGRAM WILLIAM, P., III;HOLZWORTH, MONTA, R.;KLEIN, RICHARD