发明名称 MANUFACTURE OF X-RAY MASK
摘要 <p>PURPOSE:To form a metal thin film between an X-ray transmitting film and a metal which mainly plays a role as an X-ray absorber and to eliminate that the transmission factor of alignment light is disturbed in a part where the pattern of the metal thin film is not formed without reducing the X-ray absorber and without causing the film-thickness distribution and the damage of the X-ray transmitting film. CONSTITUTION:In the manufacturing method of an X-ray mask, the X-ray mask is provided with a metal thin film between an X-ray transmitting film 12 formed on a holding frame and a metal formed on the X-ray transmitting film and serving as an X-ray absorber 16. The metal serving as the X-ray absorber is formed into a desired pattern, and only a part where the pattern of the metal thin film is not formed is oxidized to form a metal oxide 17.</p>
申请公布号 JPH05182898(A) 申请公布日期 1993.07.23
申请号 JP19910326717 申请日期 1991.11.15
申请人 CANON INC 发明人 CHIBA KEIKO
分类号 G03F1/22;H01L21/027;H01L21/30 主分类号 G03F1/22
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