发明名称 |
Method of manufacturing a surface-emitting type semiconductor laser device |
摘要 |
A method of manufacturing a surface-emitting-type semiconductor laser device having a buried structure. A GaAlAs film is used as a mask layer in forming a GaAlAs/GaAs system burying part around a GaAlAs/GaAs system buried part. The mask layer can be formed continuously together with an active layer, a cladding layer and the like which constitute the buried part by means of a crystal growing apparatus for forming the buried part. When the system is etched, the GaAlAs film mask prevents the system buried part from becoming undercut so that the mask has better resistance to peeling during subsequent processing.
|
申请公布号 |
US5236864(A) |
申请公布日期 |
1993.08.17 |
申请号 |
US19920883923 |
申请日期 |
1992.05.12 |
申请人 |
RESEARCH DEVELOPMENT CORPORATION OF JAPAN;TOKYO INSTITUTE OF TECHNOLOGY;SANYO ELECTRIC CO., LTD. |
发明人 |
IGA, KENICHI;IBARAKI, AKIRA;KAWASHIMA, KENJI;FURUSAWA, KOTARO;ISHIKAWA, TORU |
分类号 |
H01S5/183;H01S5/227;H01S5/323 |
主分类号 |
H01S5/183 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|