发明名称 |
HOCHFREQUENZ-IONENQUELLE. |
摘要 |
A high-frequency ion source uses a tubular plasma vessel of a shape to suit the desired ion beam which is clamped between a carrier plate and a cover plate. An electron cyclotron wave resonance can achieve a plasma excitation at low gas pressure. A tunable intermediate circuit is fitted between H.F. generator and load circuit coil. A stationary magnetic field is produced by a pair of HELMHOLTZ coils with a geometry to match the shape of the plasma vessel. The carrier plate has a system of electrodes for the ion extraction, consisting of ion optics to suit the desired geometry of the ion beam.
|
申请公布号 |
DE3881879(D1) |
申请公布日期 |
1993.07.22 |
申请号 |
DE19883881879 |
申请日期 |
1988.03.16 |
申请人 |
OECHSNER HANS PROF DR RER NAT |
发明人 |
OECHSNER HANS PROF DR RER NAT |
分类号 |
H01J27/16;H01J27/18;H01J37/08;(IPC1-7):H01J27/18 |
主分类号 |
H01J27/16 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|