发明名称 HOCHFREQUENZ-IONENQUELLE.
摘要 A high-frequency ion source uses a tubular plasma vessel of a shape to suit the desired ion beam which is clamped between a carrier plate and a cover plate. An electron cyclotron wave resonance can achieve a plasma excitation at low gas pressure. A tunable intermediate circuit is fitted between H.F. generator and load circuit coil. A stationary magnetic field is produced by a pair of HELMHOLTZ coils with a geometry to match the shape of the plasma vessel. The carrier plate has a system of electrodes for the ion extraction, consisting of ion optics to suit the desired geometry of the ion beam.
申请公布号 DE3881879(D1) 申请公布日期 1993.07.22
申请号 DE19883881879 申请日期 1988.03.16
申请人 OECHSNER HANS PROF DR RER NAT 发明人 OECHSNER HANS PROF DR RER NAT
分类号 H01J27/16;H01J27/18;H01J37/08;(IPC1-7):H01J27/18 主分类号 H01J27/16
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