| 发明名称 |
Method for producing flat CVD diamond film. |
| 摘要 |
<p>A chemical vapor deposition method for producing a flat diamond film substantially free of cracks by forming the diamond film on the surface of a substrate having a convex growth surface wherein the radius of curvature is matched with the tensile stress within the diamond coating produced to compensate for distortion when the film is separated from the substrate.</p> |
| 申请公布号 |
EP0551730(A1) |
申请公布日期 |
1993.07.21 |
| 申请号 |
EP19920310952 |
申请日期 |
1992.12.01 |
| 申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
KNEMEYR, FRIEDEL SIEGFRIED;SLUTZ, DAVID EARL |
| 分类号 |
B01J19/00;C23C16/01;C23C16/26;C23C16/27;C23C16/458;C30B25/02;C30B25/18;C30B29/04;H01L21/205 |
主分类号 |
B01J19/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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