| 摘要 |
A V-shaped groove having a rugged outline is formed in the substrate. A plurality of element regions in the substrate are isolated from one another by the V-shaped groove. A projection or a recess of said V-shaped groove satisfies the condition Lnxtan theta <Wn and Lnxtan theta <D, where Ln represents the length of a projection edge or a recessed edge of the top portion of said V shaped groove, Wn represents the width of the projection or the recess , D represents the depth of the V-shaped groove, and theta represents an error between said substrate and a mask formed on said substrate to obtain said V-shaped groove. As a result, the distance between a corner of the mask and the corresponding top edge of the V-shaped groove is minimized, and the area of the element region is maximized.
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