发明名称 Method for heat-treating gallium arsenide monocrystals
摘要 A heat-treating method for an indium-doped dislocation-free gallium arsenide monocrystal having a low carbon concentration and grown in the Liquid Encapsulated Czochralski method, comprising a two-step heat treatment: (i) heating the monocrystal at a temperature between 1050 DEG C. and 1200 DEG C. for a predetermined time length, and cooling the monocrystal quickly; and (ii) heating the monocrystal at a temperature between 750 DEG C. and 950 DEG C. for a predetermined time length, and cooling the monocrystal quickly.
申请公布号 US5228927(A) 申请公布日期 1993.07.20
申请号 US19910677036 申请日期 1991.03.29
申请人 SHIN-ETSU HANDOTAI COMPANY LIMITED 发明人 KITAGAWARA, YUTAKA;KUWAHARA, SUSUMU;TAKENAKA, TAKAO
分类号 C30B33/00 主分类号 C30B33/00
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