发明名称 |
Method for heat-treating gallium arsenide monocrystals |
摘要 |
A heat-treating method for an indium-doped dislocation-free gallium arsenide monocrystal having a low carbon concentration and grown in the Liquid Encapsulated Czochralski method, comprising a two-step heat treatment: (i) heating the monocrystal at a temperature between 1050 DEG C. and 1200 DEG C. for a predetermined time length, and cooling the monocrystal quickly; and (ii) heating the monocrystal at a temperature between 750 DEG C. and 950 DEG C. for a predetermined time length, and cooling the monocrystal quickly.
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申请公布号 |
US5228927(A) |
申请公布日期 |
1993.07.20 |
申请号 |
US19910677036 |
申请日期 |
1991.03.29 |
申请人 |
SHIN-ETSU HANDOTAI COMPANY LIMITED |
发明人 |
KITAGAWARA, YUTAKA;KUWAHARA, SUSUMU;TAKENAKA, TAKAO |
分类号 |
C30B33/00 |
主分类号 |
C30B33/00 |
代理机构 |
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代理人 |
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地址 |
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