PRODUCTION OF ANTISTATIC FILM

摘要

PURPOSE:To form an extremely thin antistatic film having a film thickness of nanometer level on the substrate surface without impairing a function native to the substrate by introducing a electrically conductive group into a molecule of a chemical adsorption film using a chemical adsorption method. CONSTITUTION:For example, a hydroxy group of the surface of film substrate 21 is brought into constant with SiCl4 and the obtained product is hydrolyzed to provide a siloxane monomolecular film 23. The film 23 is brought into contact with a nonaqueous solution containing, e.g. HSi(CH3)2(CH2)19SiCl3 to form a chemically adsorbed monomolecuar film 24. Then terminals of the monomolecular film 24 are modified into antistatic groups such as hydroxyl groups 25 by alkali treatment or oxidation treatment.