Arrangement for measuring plasma parameters in high frequency discharges - contains Langmuir plasma probe and high frequency filter for modulation suppression

摘要

The arrangement contains a Langmuir plasma probe which can be inserted into a plasma reactor and a high frequency filter arrangement for suppressing the modulation of the potential between the probe and the plasma. The electrical lead from the high frequency filter arrangement to the probe tip serves as an element of the filter arrangement. The remaining filter components are outside the plasma reactor. The entire high frequency voltage is dropped across the impedance of the probe tip. USE/ADVANTAGE - E.g. for use in surface treatment, depositing decorative layers, surface hardening, forming layers or removing material during the fabrication of semiconductor integrated circuits, and heating plasma fusion reactors. The arrangement can use any shape of Langmuir probe without structural alteration.