发明名称 Washing apparatus
摘要 A washing apparatus for performing a batch treatment of a plurality of wafers has a vessel and a wafer boat dedicated to the vessel and movable in the vertical direction. The boat has a fork, which supports the wafers in the vessel in a manner such that the wafers are spaced from one another at predetermined intervals. The wafers are received in a carrier, and are transferred to the boat by a rotary transfer arm. This arm has a fork for supporting the wafers during transfer thereof in a manner such that the wafers are spaced from one another at the predetermined intervals. Transfer of the rotary transfer arm is performed above the washing vessel by moving the boat up and down. At this time, the forks of the boat and arm engage with each other.
申请公布号 US5226437(A) 申请公布日期 1993.07.13
申请号 US19910795762 申请日期 1991.11.21
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON KYUSHU LIMITED 发明人 KAMIKAWA, YUJI;INOUE, MASAFUMI;NISHI, MITSUO
分类号 H01L21/00;H01L21/677 主分类号 H01L21/00
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