| 摘要 |
<p>PURPOSE:To provide an X-ray exposure mask and a mask blank in which an alignment accuracy of the mask and a wafer, etc., is improved. CONSTITUTION:This X-ray exposure mask comprises a frame 2 having an opening 20 at a center, a back-etch stopper film 3 held at the peripheral edge of the frame 2, a reflection preventive film 41 formed thereon, a transmission support film 5 for transmitting both an alignment light formed thereon and an X-ray, a reflection preventive film 42 formed thereon, and an X-ray absorber 6 formed in a pattern state thereon as main elements. A variation in permeability of the alignment light can be suppressed by the films 41, 42, and a contact of the reflection preventive film with etchant can be avoided by the operation of the film 3, and hence an effect of increasing a selecting range of a material to be applied is also provided.</p> |
