X-ray mask and its fabricating method-comprising a first and second alignment pattern

摘要

An object of the sub- invention is to offer a X-ray mask capable of providing sufficiently strong alignment signal and to improve alignment accuracy. The X ray mask of the subject invention becomes the circuitry pattern and the alignment pattern on one main surface of the X-ray permeable film. Since the structure is also provided with a X-ray absorbant pattern, and this structure enables the laser beam without attenuation to illuminate the alignment pattern formed on the other surface of the X-ray permeable film, and by further optimizing the height of the alignment marks, a sufficiently strong alignment signal is obtained.