| 摘要 |
<p>PURPOSE:To improve mass productivity and manufacturing yield by forming a transparent conductive layer to become a pixel electrode on a second conductive layer to become source.drain electrodes, and so removing the transparent layer by etching as to allow the upper surface of the second layer and outputs of its periphery and a scan signal wiring to remain. CONSTITUTION:A scan signal wiring and a first conductive layer 12 to become a gate electrode are formed on a substrate 11 and patterned. An insulating layer 13 to become a gate insulating film, a first semiconductor layer 14 to become a channel, a second semiconductor layer 15 to become an ohmic contact, and a second semiconductor layer 16 to become source.drain electrode and a picture signal wiring are sequentially laminated on the layer 12. The layers 16, 15, 14 and the insulating layer are etched. Then, a transparent conductive layer to become a pixel electrode is formed, etched, a passivation layer is formed, and a predetermined part is removed by etching. Thus, only four photomasks may be sufficient to improve mass productivity.</p> |
