| 摘要 |
PURPOSE:To improve balance of sensitivity, resolution, and heat resistance and to enhance aptitude to microfabrication by incorporating a specified compound, an alkali-soluble resin, and naphthoquinone-1,2-diazido photosensitive agent. CONSTITUTION:The resist pattern is obtained by applying this photoresist composition on a substrate and exposing and developing it, and this composition comprises the alkali-soluble resin and the naphthoquinone-1,2-diazido photosensitive agent and the compound represented by formula I in which R1 is H, methyl, or ethyl: R2 is H or a group of formula II; each of R3-R5 is, independently, H or <=3C alkyl or alkoxy; and n is 1 or 2, and when n is 1, R2 is not H. It is preferred to use the compound of formula I in an amount of 5-25 % of the total amount of the alkali-soluble resin, and the alkali-soluble resin is embodied by novolak resins and the like. |
