COMPOSITION FOR PHOTORESIST

摘要

PURPOSE:To obtain a compsn. for a photoresist useful for photoresist patterning in the production of a semiconductor device, an integrated circuit, and an offset printing plate, etc. CONSTITUTION:Fine powder of a metal oxide or metal oxyhydroxide having 0.002-0.2mum average particle diameter is incorporated into a photosensitive resin such as novolak resin by 0.05-20wt.% to obtain the objective compsn. for a photoresist.