| 摘要 |
An integrated circuit inductor is disclosed which can be fabricated by adding simple follow-on steps to standard fabrication line processes. In a preferred embodiment, standard CMOS technology is used to fabricate a multi-turn coil having its axis normal to the layers of oxide, polysilicon, and metal which form the coil. For a coil 100 microns on a side, an inductance on the order of 10 nH can be achieved. By including a magnetic core in the design using the disclosed procedure, this value can be increased to as high as 0.1 mH. Thus, inductor values ranging from 0.001 mH-0.1 mH can be physically implemented as integrated, highly-miniaturized CMOS designs for analog operation in the range of approximately 1-100 MHz.
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