| 摘要 |
PURPOSE:To provide a method and a control device for positioning with excellent reproducibility which accurately position a semiconductor substrate against a focal position on a projection system even in projecting a desired pattern onto a surface with steps. CONSTITUTION:A light beam 9 is applied to a flat part 26 of a surface 12 subjected to projection. At that time, the light beam is narrowed smaller than the area of the flat part 26. Also it is radiated from the direction in which it intersects the optical axis 2 at a specified angle and it passes through the focal position F on a projection system 1. The semiconductor substrate 21 is relatively positioned against the focal position F depending on the intensity of the light 10 reflected from the flat part 26. |
