FORMATION OF SILICON DIOXIDE FILM,申请号JP19910344508-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	FORMATION OF SILICON DIOXIDE FILM
摘要
申请公布号	JPH05171465(A)	申请公布日期	1993.07.09
申请号	JP19910344508	申请日期	1991.12.26
申请人	FURUKAWA ELECTRIC CO LTD:THE	发明人	OTSUKI YASUO;KIKUTA TOSHIO
分类号	C01B33/12;C04B41/50;C23C26/00	主分类号	C01B33/12
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Method and Installation for Producing Cast-in-situ Piles

False Twist Draw Texturising Machines

LOW-PHOSPHATE DETERGENT COMPOSITION FOR FABRIC WASHING

SHEDDING MOTIONS

DIELECTRIC CERAMICS

Process for preparing modified particulate and/or fibrous, crystalline and amorphous inorganic substances

Apparatus for loading or unloading pallets

CONVEYOR PAN FOR SCRAPER CHAIN CONVEYOR

An auxiliary tent that can be fitted to the roof of vehicles

A data device for a writing implement

CUTTING DEVICE FOR EXTRUSION PRESS

Machining elongate magnetic articles

FORAGE HARVESTER FEED ROLL MOUNTING MECHANISM

Agricultural seed drills

Stirring weld metal

DEVICE FOR THE CONTACTLESS MEASURING OF THICKNESS OR DISTANCE