发明名称 RESIST RESIN COMPOSITION FOR CHEMICAL PLATING
摘要 PURPOSE:To provide the title composition excellent in rapid curability and resolution and capable of forming a thick film. CONSTITUTION:The title composition consists mainly of an epoxy resin having a viscosity of 150P or above at 25 deg.C and containing at least two glycidyl ether groups directly bonded to the aromatic ring, an oxirane compound having a boiling point of 140 deg.C or above and a molecular weight of 500 or below, a thermally latent cationic polymerization initiator and a photosensitive cationic polymerization initiator. This composition is very excellent in curability and resolution and can give a thick resist pattern for chemical plating by the screen printing process and can afford the rational formation of a circuit pattern of a large conductor thickness by the additive process.
申请公布号 JPH05171084(A) 申请公布日期 1993.07.09
申请号 JP19910354991 申请日期 1991.12.20
申请人 NIPPON SODA CO LTD 发明人 TAKAHASHI EIJI;MORIKAWA TAKAO;KOBAYASHI EIICHIRO
分类号 C08G59/20;C08G59/68;C09D11/00;C09D11/02;C09D11/03;C09D11/10;C09D11/101;C09D11/102;H05K3/18 主分类号 C08G59/20
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