METHOD FOR COATING GLASS SUBSTRATES

摘要

A method for coating glass by chemical-vapor deposition below 200 DEG C, at atmospheric pressure of a gaseous mixture of a tin oxide precursor, a silicon dioxide precursor and an accelerant such as triethyl phosphite provides deposition rates greater than 350 ANGSTROM per second. The layer of material deposited can be combined with other layers to produce an article with specific properties such as controlled emissivity, refractive index, abrasion resistance, and appearance.