| 摘要 |
<p>This invention relates to an apparatus for forming a high-quality thin film at a high speed. This invention is characterized by including an evacuation means, a starting gas supply means, a ceramic filter for blowing out a starting gas, disposed at a position facing a wafer susceptor equipped with a heating means and an activation means for the starting gas in order to improve adsoprtion probability of the starting gas to the wafer surface.</p> |
