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发明名称
MANUFACTURING METHOD OF SEMICONDUCTOR IC DEVICE
摘要
申请公布号
KR930006139(B1)
申请公布日期
1993.07.07
申请号
KR19920018776
申请日期
1992.10.13
申请人
HITACHI LTD.
发明人
IWAI, HIDETOSHI;MITSUSADA, KATSUMICHI;ISHIHARA, MASAMICHI;MATSUMOTO, TETSURO;MIYAZAWA, KATSUYUKI
分类号
H01L29/78;(IPC1-7):H01L29/78
主分类号
H01L29/78
代理机构
代理人
主权项
地址
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