发明名称 SEMICONDUCTOR FABRICATING UNIT
摘要 A semiconductor fabricating unit used for the photochemical vapor phase growth process in which a first reaction gas decomposed by excitation with a laser beam is reacted with a second reaction gas turned into plasma by a plasma generator in a reaction chamber where a substrate is placed, so that a variety of layers are formed on the substrate at a low temperature. In the reaction chamber are further provided upper and lower electrodes that are opposed to each other. The electrode on the upper side is connected to an r-f power source and the electrode on the lower side is used as the common electrode on which the substrate is mounted, thereby controlling the rate of forming the layer. Further, a source of ultraviolet rays is provided to irradiate the interior of the reaction chamber with ultraviolet rays so that a dense layer can be formed.
申请公布号 WO9313552(A1) 申请公布日期 1993.07.08
申请号 WO1987JP01045 申请日期 1987.12.26
申请人 ODA, MASAO,;KOBAYASHI, TOSHIYUKI,;KINOSHITA, YOSHIMI, 发明人 ODA, MASAO,;KOBAYASHI, TOSHIYUKI,;KINOSHITA, YOSHIMI,
分类号 C23C16/452;C23C16/48;C23C16/517 主分类号 C23C16/452
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