Fabrication of submicron design rule large scale integrated circuits depends upon use of a strut-segmented mask with struts providing mechanical support to permit thinned mask segments consequently yielding improved resolution. "Stitching" - positioning of projected segment images to yield a satisfactory continuous image - is aided by lithographically defined skirts forming a continuous border within strut-supported segments.
申请公布号
EP0550173(A1)
申请公布日期
1993.07.07
申请号
EP19920311251
申请日期
1992.12.10
申请人
AMERICAN TELEPHONE AND TELEGRAPH COMPANY
发明人
BERGER, STEVEN D.;LEVENTHAL, MARVIN;LIDDLE, JAMES A.