Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns

摘要

A photoactive compound having formula (I): <IMAGE> (I) wherein R is selected from the group consisting of hydrogen or a lower alkyl group having 1-4 carbon atoms and each D is individually selected from the group consisting of a hydrogen or photoactive o-quinonediazide sulfonyl group; subject to the proviso that at least two of the four D's in formula (I) are photoactive o-naphthoquinonediazide sulfonyl moieties.