| 摘要 |
PURPOSE:To improve adhesive strength of a resist to a substrate and to prevent generation of scum in a space part by adding furthermore an antioxidant into a negative resist solution consisting of a solvent and a polymer. CONSTITUTION:The antioxidant is added furthermore into the negative resist solution consisting of the solvent, the polymer and a crosslinking agent and/or a photosensitive agent. A phenolic antioxidant, a sulfur contained antioxidant or these mixture is preferably used as the antioxidant. The polymer in the negative resist solution consisting of the solvent and the polymer preferably contains a structure unit expressed by a formula. In the formula, R is each of 1-4C alkyl group, alkoxy group, hydroxyl group, nitro group, alkyl halide group, halogen group, hydrogen group or these mixture, each of R1, R2 is each of 1-4C alkyl group, alkyl halide group, halogen group, hydrogen or these mixture. |
