发明名称 Electron beam appts. for testing IC logic circuit - contains remote focus beam generator, beam gate, deflection unit, magnetic lens and secondary electron detector
摘要 The arrangement contains a remote focus beam generator (1) forming an intermediate image of an electron source (8), a beam gating system (3), beam deflection unit (5), magnetic objective lens (7) and detector system (26). The lens forms an image of the intermediate image on a specimen. The detector system detects secondary electrons from the specimen (10). The lens has an iron loop (19) open towards the specimen which allows the beam focussing field to also act at the specimen location. A suction electrode (21) at positive potential and a cooling element are mounted in the lens pole shoe gap. An electron braking electrode is mounted above the suction electrode ADVANTAGE - The electron beam arrangement is simple and can be made at economical cost. Eg for measuring potentials on microcircuit connection pads.
申请公布号 DE4239443(A1) 申请公布日期 1993.07.01
申请号 DE19924239443 申请日期 1992.11.24
申请人 SIEMENS AG, 8000 MUENCHEN, DE 发明人 PLIES, ERICH, DR., 8000 MUENCHEN, DE
分类号 G01R31/305 主分类号 G01R31/305
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